Material	Formula	Standard Purities, %	Theoretical Density, g/㎤	Melting Point, ℃	Fabrication Method*	Applications
Aluminum-copper	Al-xCu	99.999 99.99	2.70	660	1	Conductor contacts in microcircuits.
Aluminum-silicon	Al-xSi
Aluminum-silicon copper	Al-xSi-yCu
Chromium-silicon monoxide	70wt.% Cr-30wt. %SiO	99.9	4.20	-	2	Excellent thin film resistors for integrated circuits.
	60wt.%Cr - 40 wt.% SiO		3.69	-
	50wt.%Cr - 50wt.% SiO		3.29	-
	x wt.% Cr - y wt.% SiO		varies	varies
Cobalt-iron	xCo - yFe	99.99	varies	varies	1 & 2	Magnetic films.
Cobalt-nickle	xCo - yNi		8.90	1475
Gallium arsenide	GaAs	99.999	5.3	1240	2	Semiconductors.
Gallium phosphide	GaP		4.14	1480
Inconel	78 wt.% Ni - 15 wt.% Cr - 7wt.% Fe	99.999	8.51	1425	1	Good corrosion resistance. Thin film resistance. Good film adherence.
Indium antimonide	InSb	99.999	5.8	523	2	Semiconductors.Masers. Coherent emission from diffused diodes. Semiconductors.Oxidize to give transparent, conductive films.
Indium arsenide	InAs		5.66	943
Indium phosphide	InP		4.79	1058 at 21 atm
Indium-tin	xIn - ySn	99.999 99.99	7.3	varies	1
Manganese-iron	xMn - yFe	99.99	varies	varies	2	Magnetic films.
Manganese-nickel	xMn - yNi
Nickel-chromium	x wt.% Ni - y wt.% Cr	99.9	7.96-8.48	1340-1675	1 & 2	Thin film resistors. Good adherence on non-metals. Good corrosion resistance.
Nickel-iron	81wt.% Ni - 19wt.% Fe	99.99	8.00	1473	1 & 2	Thin films for magnetic heads. Bubble memory devices.
	xNi - yFe		varies	varies
Nickel-titanium	xNi - yTi	99.9	varies	varies	1 & 2	A "shape memory" alloy. Used in circuits; vanadium renders nickel non-magnetic.
Nickel-vanadium	93wt.% Ni - 7 wt.% V	99.7	8.60	1460
Niobium-titanium	xNb - xTi	99.99	varies	varies	2	Proprietary electronic uses.
Niobium-zirconium	xNb - xZr
Permalloy	79wt.% Ni - 16.7wt.% Fe - 4wt.% Mo - 0.3wt.%Mn	99.5	8.74	-	1 & 2	Thin films for magnetic heads. Bubble memory devices.
Terbium-iron	xTv - yFe	99.9	varies	varies	2	Magneto-optic, sensitive to light changing flux fields.
Tungsten-titanium	90wt.% W - 10wt.%Ti	99.995 (Na<1 ppm)	14.6	1860	2	Diffusion barriers, primarily between Pt silicide contacts and other interconnects.
		99.9 (Na = 300-500 ppm)
		99.9(Na<10 ppm)
Vanadium-aluminum	xV-yAl	99.7	varies	varies	2	Proprietary research uses.
Zirconium-aluminum

** Fabrication Methods : (1) Vacuum melted (2) Hot-pressed