Material	Formula	Standard Purities, %	Theoretical Density, g/㎤	Melting Point, ℃	Fabrication Method	Applications
Aluminum oxide	Al2O3	99.99	3.99	2045	Hot-pressed	Protection of aluminum mirrors. High temperature dielectric.
Antimony oxide	Sb2O3	99.9	5.20	655	Hot-pressed	Dielectric interference filter for ultra-violet radiation; use with cryolite.
Barium titanate	BaTiO3	99.9 99.6	6.06	1612	Hot-pressed	Thin-film capacitor.
Bismuth oxide	Bi2O3	99.9	8.9	820	Hot-pressed	Beam splitter.
Bismuth titanate	Bi2Ti4O11	99.9	6.09	900	Hot-pressed	Dielectric thin film. For metallizing paper, etc.Beam splitter. Base coating for gold films for heating elements on glass.
Bismuth titanate	Bi4Ti3O12		8.11
Cerium oxide	CeO2	99.9	7.30	1950	Hot-pressed	High index film; multilayer; anti-reflection coating.
Chromium oxide	Cr2O3	99.8	5.21	2000	Hot-pressed	Absorbent brown film with medium index.
Europium-doped yttrium vanadate	YVO3-xEu2O3	99.9	varies	varies	Hot-pressed	Phosphorescent coating on special currency papers.
Gallium oxide	Ga2O3	99.999	5.88	1900	Hot-pressed	Dielectric film.
Germanium oxide	GeO2		4.23	1115
Hafnium oxide (unstabilized)	HfO2	99.95	9.68	2790	Hot-pressed	Dielectric coating. Very hard, adherent film.
Hafnium oxide (stabilized)	HfO2—10-15 wt. % CaO	99.0	varies	varies
Hafnium oxide (stabilized)	HfO2—10-15 wt. % Y2O3
Indium oxide	In2O3	99.999 99.99	7.18	2000	Hot-pressed	Transparent conductive films in electro-optical displays of the liquid crystal, electro-luminescent and gas discharge types.
Indium oxide- tin oxide	xIn2O3 - ySnO2		varies	varies
Iron oxide	Fe2O3	99.99 99.9	5.25	1565	Hot-pressed	Beam splitter and interference layers. Magnetic films.
	Fe3O4	99.5	5.18	1594
Lanthanum oxide	La2O3	99.99	6.6	2250	Hot-pressed	Thin film capacitors. Possible uses in PLZT devices. (Very moisture sensitive.)
Lead titanate	PbTiO3	99.9	7.52	-	Hot-pressed	Thin film capacitors.
Lead zirconate	PbZrO3	99.7	7.81	-
Lithium niobate	LiNbO3	99.9	4.64	1253	Hot-pressed	Piezoelectrics.
Lutetium iron oxide (garnet)	Lu3Fe5O12	99.9	7.15	-	Hot-pressed	Bubble memory devices.
Magnesium oxide	MgO	99.99 99.5	3.58	2802	Hot-pressed	High tempature dielectric.
Molybdenum oxide	MoO3	99.99	4.69	795	Hot-pressed	Luminescent coatings.
Niobium oxide	Nb2O5	99.95	4.47	1460	Hot-pressed	Dielectric coating. Multilayers.
Rare earth garnets	Ln3M5O12	99.9	varies	varies	Hot-pressed	Bubble memory devices.
Rare earth oxides	varies	99.999, 99.99 99.9	varies	varies	Hot-pressed	Possible dielectric coatings.
Silicon dioxide	SiO2	99.995 99.97	2.21	1713	Hot-pressed	Hard durable film with low index. Insulating layer.
Silicon monoxide	SiO	99.99 99.9	2.13	1700	Hot-pressed	Protective film for front surface aluminized mirrors. Low index layer for infrared filters.
Strontium titanate	SrTiO3	99.9	4.15	2040	Hot-pressed	Thin film capacitors.
Strontium zirconate	SrZrO3	99.0	5.48	-
Tantalum oxide	Ta2O5	99.95	7.53	1880	Hot-pressed	Dielectric film. Multilayers.
Thorium oxide	ThO2	99.99	9.86	2100	Hot-pressed	RADIOACTIVE. Highly durable beam splitter.
Tin oxide	SnO2	99.9	6.85	1930	Hot-pressed	Transparent conductive film. Also in varistors.
Titanium oxide	TiO2	99.995 99.9	4.24	1855	Hot-pressed	High index film, multilayer interference filters.
Tungsten oxide	WO3	99.99	7.16	1473	Hot-pressed	Shadow casting for electron microscopy.
Yttrium aluminum oxide (YAG)	Y3Al5O12	99.9	4.55	1950	Hot-pressed	Bubble memory devices.
Yttrium iron oxide (garnet)	Y3Fe5O12	99.99 99.9	5.10	1575	Hot-pressed	Ferromagnetic films. Bubble memory devices.
Yttrium oxide	Y2O3	99.999 99.99, 99.9	4.84	2400	Hot-pressed	Hard film. Dielectric coating. Thin film capacitor.
Zinc oxide	ZnO	99.999 99.9	5.66	1975	Hot-pressed	Dielectric, in varistors, in gas sensors.
Zirconium oxide (unstabilized)	ZrO2	99.7	5.56	2687	Hot-pressed	Multilayers. Dielectric coating. Adherent coating with high refractive index.
Zirconium oxide (stabilized)	ZrO2—5-15 wt. % CaO	99.0	varies	varies
	ZrO2—10-15 wt. % Y2O3